D type cavity single target DC magnetron sputtering coater
single target DC magnetron sputtering coater is equipped with a DC power supply and can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
D type cavity single target DC magnetron sputtering coater is a laboratory-specific coater with two target positions developed by our company. The equipment is equipped with a DC power supply and can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and high speed, high coating rate, low sample temperature rise, and is a typical high-speed and low-temperature sputtering. The magnetron target is equipped with a water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time.
This model adopts a target-down layout, with the sample table on the top. The height with the target surface can be accurately adjusted through the program, and it can be heated rotatably, with excellent performance.
D type cavity single target DC magnetron sputtering coater:
Product name | D type cavity single target DC magnetron sputtering coater |
Product model | CY-MSH500X-I-DC-SS |
Power supply voltage | AC220V，50Hz |
Complete machine power | 6KW |
Ultimate vacuum degree | 9x10-4Pa |
Sample stage | Dimensions | 200mm |
Height | 70mm up and down precise adjustment |
Heating temperature | RT-500℃ |
Speed | 1-20rpm |
Magnetron sputtering head parameters | Quantity | 1 4” magnetron sputtering head |
Cooling method | Water cooling, required flow rate 10L/min |
Water cooler specifications | 10L/min circulating water chiller |
Vacuum chamber | Cavity size | φ500mm X550mm H |
Cavity material | Stainless steel |
Observation window | φ100mm |
Opening method | Front door |
Gas flow controller | 1 mass flow meter is used to control the Ar flow rate, with a range of 200SCCM Ar; |
Vacuum pump | Equipped with a molecular pump system, with a pumping speed of 1200L/S |
Film thickness meter | One quartz vibration film thickness gauge, with a resolution of 0.10 Å |
Sputtering power supply | One DC power supply, 500W, suitable for the preparation of metal films |
Operation method | CYKY self-developed professional control system |
Overall dimensions | 1250mm X 1000mm X2000mm |
Overall weight | 500kg |
