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Desktop double target magnetron sputtering coater with stainless steel cavity for Cr deposition on waferDesktop double target magnetron sputtering coater with stainless steel cavity for Cr deposition on waferDesktop double target magnetron sputtering coater with stainless steel cavity for Cr deposition on wafer

Desktop double target magnetron sputtering coater with stainless steel cavity for Cr deposition on wafer

    This equipment is a double target magnetron sputtering coater,it can be used in the preparation of metal film,and also used in electronic fields,optical fields,special field of ceramic preparation ,it surely can be used in SEM sample preparation in laboratory

This equipment is a double target magnetron sputtering coater,it can be used in the preparation of metal film,and also used in electronic fields,optical fields,special field of ceramic preparation ,it surely can be used in SEM sample preparation in laboratory。

This set is double target magnetron sputtering coater equipped with high vacuum stainless steel cavity, the cavity is set with a quartz observation window baffle, which is easy to observe and record the experiment; The cavity design with excellent vacuum performance and small shape makes it very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, and intuitive operation interface, easy to get started.  

 

Technical Parameters:

product name

Desktop stainless steel cavity double target magnetron sputtering   coating apparatus

Product number

CY-MSZ254-I I -DC-SS

sample stage

 

Dimensions

φ100mm

Heating temperature

500

Adjustable speed

20rpm

Magnetic target gun

Equipped with a two-inch magnetic control target, target size: diameter   50.8mm, thickness 3mm

vacuum chamber

 

Cavity size

φ254mm X 300mm

observation window

omnidirectionally transparent

Cavity material

304 stainless steel

Opening method

Top cover and front door

Vacuum system

 

Backing pump

Low noise bipolar rotary vane pump

Molecular pump

Low noise and high pumping speed turbomolecular pump

Vacuum measurement

Composite vacuum gauge, range: 10-5~105Pa

Air extraction interface

KF16

Exhaust interface

KF16

System vacuum

1.0×10-4Pa

Power supply

AC 220V 50/60Hz

Pumping rate

The pumping speed of the molecular pump is 600L/s, and the pumping speed   of the backing pump is 1.1L/s.

Power configuration

 

Number of power supplies

A set of DC power supply

Output Power

DC power supply 500W

Other parameters

Supply voltage

AC220V,50Hz

Total power

2kW

Overall size

550mm X 350mm X450mm

Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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