Split type High Vacuum Dual-Target Magnetron Sputtering Coating Machine for Ferroelectric thin films

The dual-target magnetron sputtering coating machine is a cost-effective magnetron sputtering coating equipment independently developed by our company, featuring standardization, modularization, and customizability. The magnetron targets are available in 1-inch and 2-inch options, allowing customers to choose based on the size of the substrate to be coated. Equipped with two 500W DC power supplies, this machine is suitable for preparing metal films, and the two targets cater to the needs of multi-layer or multiple coating processes.

The coating machine is equipped with two high-precision mass flow controllers, and customers can customize up to four MFCs for gas paths to meet complex gas environment construction requirements. The instrument comes standard with an advanced turbo molecular pump set, capable of achieving an ultimate vacuum of 1.0E-5Pa. Additionally, other types of molecular pumps are available for selection. The gas path of the molecular pump is controlled by multiple solenoid valves, enabling the opening of the chamber and retrieval of samples without turning off the pump, significantly enhancing your work efficiency. Optionally, an all-in-one industrial control computer can be equipped to control the system, allowing for the majority of functions, such as the control of vacuum pump sets and sputtering power supplies, to be executed through computer programs, further boosting your experimental efficiency.

Application Range:
The dual-target magnetron sputtering coating machine is suitable for preparing single-layer or multi-layer ferroelectric films, conductive films, alloy films, etc. Compared to similar equipment, it boasts a wide range of applications while being compact and easy to operate, making it an ideal device for preparing material films in laboratories.

Technical Specifications:
Technical specifications of the dual-target magnetron sputtering coating machine: