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PP Cavity Spin Coater for Photoresist spin coatingPP Cavity Spin Coater for Photoresist spin coatingPP Cavity Spin Coater for Photoresist spin coatingPP Cavity Spin Coater for Photoresist spin coatingPP Cavity Spin Coater for Photoresist spin coating

PP Cavity Spin Coater for Photoresist spin coating

    Spin coater, also known as spin coater or spin coater, is an experimental device for preparing thin films. It is mainly used to evenly coat liquid samples on substrates to form a uniform thin film. The following is a detailed explanation of the spin coater

Spin coater, also known as spin coater or spin coater, is an experimental device for preparing thin films. It is mainly used to evenly coat liquid samples on substrates to form a uniform thin film. The following is a detailed explanation of the spin coater:

 

Spin coater is a coating device that uses the centrifugal force generated by rotation for coating. It is able to produce a thin and uniform coating on a flat and smooth target.

Working principle:

The working principle of the spin coater is to add the liquid sample to the surface of the rotating substrate, and the sample is evenly distributed on the surface of the substrate through centrifugal force, and finally a uniform thin film is formed. The spin coater is usually composed of a rotating table, a control system, a nozzle, and a motor. During operation, the user needs to pour the sample on the substrate, place the substrate on the rotating table, and then control the rotation speed and rotation time so that the sample is evenly coated on the substrate surface while rotating.

Application field:

Spin coaters are widely used in many fields, including anti-corrosion coating on semiconductor wafers, coating of optical media, coating primers or photochromic solutions on lenses, etc. At the same time, it is also commonly used in research in the fields of materials science and chemistry, such as the preparation of thin films, coating, electroplating and other experiments that require uniform coverage.

The spin coater can coat liquid or colloidal materials on substrates such as silicon wafers, crystals, quartz, ceramics, etc. to form a thin film. It is mainly used for photoresist spin coating, biological medium preparation, sol-gel method for preparing polymer films, etc.

Precautions for use:

When using a spin coater, it is necessary to pay attention to the selection of a suitable spin coating liquid, which is the key to spin coating technology. In addition, it is also necessary to pay attention to controlling the rotation speed and rotation time to ensure the quality and uniformity of the coating.

Main components:

The main components of the spin coater include a base, a rotating table, a fixture, etc. These parts work together to ensure that the spin coater can work stably and accurately.

Technical parameters:

Product name

PP Chamber Spin Coater

Product model

CY-SPC8-PP-DZ

Power supply voltage

AC220V,50Hz

Speed

0~10000rpm

Acceleration

100~5000rpm/s

Speed resolution

1rpm

Single-step time

3000s

Cavity size

170mm

Cavity material

PP Chamber

Suction cup

No suction cup, need to customize   mechanical chuck

Glue dripping method

Customer design mechanical hand glue   dripping

Vacuum interface

Exhaust gas, waste liquid extraction   interface

Control method

Provide communication interface connected   to PC

Complete machine size

Chassis part requires separation from   cavity

Complete machine weight

12kg

 


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