CY-1200X-H8 is a CE standard vacuum crucible furnace. It is designed for laboratory calcining and annealing semiconductor wafer under vacuum or various protective gas. It equips a 7.5" ID x 13.4"L Quartz tube chamber sitting horizontally. Water-cooled stainless steel vacuum flanges with valves are installed to achieve a vacuum of 10-2 to10-5 Torr through a mechanical or molecular vacuum pump.
Working voltage | AC220V,50/60Hz |
Chamber structure | Swing side with water cooling flange |
Display | LCD Touch Panel |
Limited temper | 1150℃ |
Working temper | Rm~1100℃ |
Heating rate | ≤20℃/min(suggestion:10℃/min) |
Chamber material | Quartz chamber:Φ200*340mm |
Heating element | Ni-Cr-Al heating wire |
Thermcouple | K type |
Accuracy | +/-0.1℃ |
Temper uniform | 300-500℃:+/-5℃ |
Chamber capacity | 6L |
Control method | Digital PID control,30 steps“time-temperature”control |
Over temper alarm | yes |
Over current alarm | yes |
Vacuum pump | Pumping speed:4m3/h |
Water cooling | 10L/min |
Working voltage | AC220V, 50Hz |
Warranty | One year warranty with whole life technical supporting |
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