Compact Plasma Cleaner with Digital Vacuum Gauge

Compact plasma cleaner a 3" compact plasma cleaner with digital vacuum sensor and display, and as well as the hinged door. It is designed for cleaning and removing nanoscale organic contamination on wafer up to 2" with various gas easily.

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Compact plasma cleaner is an excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality.The rate of organic removal is about 10 nm/min Maximum at high RF power.

Compact plasma cleanermain features:

1. Cleaning and removing nanoscale organic contamination on wafer up to 2" with various gas easily.

2. Excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality

Hinged type door for easy sample loading.

3. 3" Diameter Quartz Chamber excellent for cleaning 2" wafer with option Quartz Boat

4. Removable Quartz tube inside Quartz Chamber easy to clean and replacement.

Compact plasma cleaner specifications:

RF Power	RF power (High voltage & high frequency current applied on the coil) is adjustable at three levels:
Plasma Chamber	3" diameter×6.5" length quartz chamber 700 mL capacity High purity quartz has longer service life than glass.
Vacuum Gauge & Display	A Stinger gauge is installed on the hinged door. 1/8" NPT needle valve to qualitatively control gas flow and chamber pressure. 1/8" NPT 3-way valve to quickly switch from bleeding in gas, isolating the chamber, and venting.
Vacuum Pump	One double stage Rotary Vane Vacuum Pump is included.
Input Power	AC 208 - 240V, 50/60Hz, single phase
Working Gases	Many inert gases can be chosen for plasma cleaning, such as N₂, Ar, Air and Mixed gas depended on what kind material will be treated. <5% H2 mixed inert gas can be used. No flammable gas shall be used for the plasma cleaner.
Net Weight	40 Lbs
Warranty	One-year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )