The plasma sputtering target is a standard size of 2 inches. Customers can choose different configurations of 1~3 targets according to their needs to meet the different experimental needs of single-layer film or multilayer films of various materials. The instrument is equipped with 150W DC high-voltage power supply, which can be used for metal sputter coating, especially for the coating of metals such as gold, silver and copper. This film coater is equipped with a gas connection for the introduction of protective gas. If the customer needs to pass the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs.
This film coater is equipped with a double stage rotary vane vacuum pump. It has the advantages of small volume, quick vacuuming and simple operation. If customers need to further improve the vacuum degree, you can contact the technician to select the molecular pump group to form a high vacuum system.
Two target heads plasma sputtering coater application:
It can be used for metal sputter coating, especially for metal coatings such as gold, silver and copper.
Two target heads plasma sputtering coater technical parameters:
Sample stage | Size | φ138mm | Temperature control accuracy | ±1℃ |
Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable |
DC sputtering target head | Quantity | 2” ×2 |
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Vacuum chamber | Chamber size | φ180mm×150mm | Watch window | Omnidirectional transparent |
Chamber material | High purity quartz | Opening mode | Top cover removable |
Vacuum system | Mechanical pump | rotary vane pump | Pumping interface | KF16 |
Vacuum measurement | Resistance gauge | Exhaust interface | KF16 |
Ultimate vacuum | 1.0E-1Pa | Power supply | AC;220V 50/60Hz |
Pumping rate | rotary vane vacuum pump: 1.1L/S |
Power configuration | Quantity | DC power supply×1 | Max output power | 150W |
Other parameters | Supply voltage | AC220V,50Hz | Overall size | 360mm×300mm×470mm |
Total power | 800W | Total Weight | 30kg |
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