Aluminum Oxide (Al2O3) Sputtering Targets Overview
Aluminum oxide, or more commonly called alumina, is a chemical compound with a chemical formula of Al2O3. It is generally white or clear in appearance with a melting point of 2,072°C, a vapor pressure of 10-4 Torr at 1,550°C, and a density of 3.97 g/cc. It is most commonly found in nature as the mineral corundum, from which ruby and sapphire are derived. Aluminum oxide is used extensively as an abrasive and is utilized in various industrial applications. It can also be found in paint, cosmetics, and surgical implants. It is evaporated under vacuum to form dielectric films for the semiconductor industry and as a mirror-like protective layer for optical coatings.
Material Type | Aluminum Oxide |
Symbol | Al2O3 |
Color/Appearance | White, Crystalline Solid |
Melting Point (°C) | 2,072 |
Theoretical Density (g/cc) | 3.97 |
Z Ratio | 0.336 |
Sputter | RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Sapphire excellent in E | beam; forms smooth, hard films. Thermal evaporation likely not possible |
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