Silicon Dioxide (Fused Quartz) (SiO2) Sputtering Targets
Silicon dioxide, also known as silica, has a chemical formula of SiO2. It has a melting point of 1,610°C, a density of 2.648 g/cc, and a vapor pressure of 10-4 Torr at 1,025°C. Silicon dioxide is commonly found in nature as sand or quartz. It is primarily used in the production of glass for windows and beverage bottles. It is evaporated under vacuum for the fabrication of optoelectronic and circuit devices.
Material Type | Silicon (IV) Oxide |
Symbol | SiO2 |
Color/Appearance | White, Crystalline Solid |
Melting Point (°C) | 1,610 |
Theoretical Density (g/cc) | ~2.65 |
Z Ratio | **1.00 |
Sputter | RF |
Max Power Density (Watts/Square Inch) | 30* |
Type of Bond | Indium, Elastomer |
Comments | Quartz excellent in E-beam. |
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