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Tantalum Oxide (Ta2O5) Sputtering Targets

Tantalum Oxide (Ta2O5) Sputtering Targets

    Tantalum Oxide (Ta2O5) Sputtering Targets


Tantalum oxide is an inorganic chemical compound with a chemical formula of Ta2O5. It is crystalline solid and white in appearance with a density of 8.2 g/cc, a melting point of 1,872°C, and a vapor pressure of 10-4 Torr at 1,920°C. It is mainly used to produce capacitors which can be found in auto electronics, cell phones, and tools. Tantalum oxide can also be found in the glass for camera lenses. It is evaporated under vacuum to form films for the fabrication of semiconductors, optoelectronic devices, and fuel cells.

Tantalum Oxide (Ta2O5) Specifications

Material Type

Tantalum Pentoxide

Symbol

Ta2O5

Color/Appearance

White, Crystalline Solid

Melting Point (°C)

1,872

Theoretical Density   (g/cc)

8.2

Z Ratio

0.3

Sputter

RF, RF-R

Max Power Density

(Watts/Square Inch)

20*

Type of Bond

Indium, Elastomer

Comments

Slight decomposition.   Evaporate Ta in 10-3 Torr   O2.

 


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