Application
1.Rapid Thermal Annealing,ion implantation annealing
2.Graphene CVD preparation, nanotube growthing
3.Rapid thermal oxidation,Rapid thermal Nitriding
4.Silicidation,diffusion,contact alloying,crystallization and densification
Model No. | CY-O1200-50IRTP |
Display | 7” LCD Touch Panel |
Limiting temperature | 1150℃ |
Working temperature | ≤1100℃ |
Heating rate | 0-100℃/min |
Heating Zone length | 400mm, constant temperature zone200mm |
Corundum tube diameter | OD50*1200mm |
Temperature accuracy | ± 1℃ |
Heating element | Alchrome |
Thermal couple | K TYPE |
Cooling method | Double layer structure with fan cooling |
Temperature control | 30 steps programmable PID control |
Chamber material | Alumina fiber |
Over-temperature alarm | Yes |
Over-current alarm | Yes |
Sealing flange | S.S vacuum flange |
Sliding method | Manual sliding |
Cooling method | air forced cooling |
Gas mixer | One way with Float Flow Controller |
Main Power | 4.5Kw |
Working voltage | AC220V,50Hz |
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